SERVICES
We offer the design of photonic integrated circuits and fabrication services in a state-of-the-art cleanroom facility, based on our expertise in silicon nitride technologies.
Our prototyping is based on the subtractive manufacturing of silicon nitride films and e-beam lithography, which guarantees flexibility, small feature sizes, and fast turnaround times. These aspects make prototyping iterations fast and simple for the user, with the possibility to push the boundaries of photonics at a rapid pace. Moreover, e-beam lithography reduces the minimum feature size to the smallest achievable dimensions, enabling the finest accuracy in devices such as DBRs or PICs based on inverse design.
We offer ready-made ring-resonator chips based on our non-linear photonic platform. Read more in the brochure below:
Why silicon nitride?
Silicon nitride (Si₃N₄) is a dielectric material used in photonic integrated circuits (PICs) because of its broadband transparency, ranging from visible light (~450 nm) to mid-infrared (~4 µm). The low absorption loss makes Si₃N₄ an excellent material for PICs with ultralow loss. An index contrast with silicon oxide (SiO₂) of ∆n ≈ 0.5 allows for sufficiently strong confinement in Si₃N₄ waveguides, enabling a small bending radius and dense PICs. The Kerr nonlinearities and the lack of two-photon absorption make silicon nitride ideal for nonlinear optic elements, such as microcavities for the generation of frequency combs.
Fabrication runs
At Iloomina, we continuously develop and push the boundaries of fabrication for our clients. Customized fabrication runs are carried out every month to achieve the performance our clients request. However, developing a new platform may require extensive testing and multiple iterations before consolidating the process.
For this reason, we are developing a standard platform for dispersion-engineered silicon nitride, where anyone can submit their design and have it fabricated in a multi-project wafer (MPW) run. We are currently finalizing tests on the platform and expect to open the first official MPW run in the spring of 2025, where you can have a preview of the platform’s performance at a discounted price
Want to sign up for upcoming runs?
Please check availability below and contact us at: info@iloomina.com
Upcoming runs
Run | Platform (SiN thickness) | Date | Availability |
---|---|---|---|
Open test run 2 | 750 nm | 30th November 2024 | Closed |
Open test run 3 | 750 nm | 28th February 2025 | Slots open |
MPW 1 | 750 nm | TBA | Slots open |